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Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer

W. Walke ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland
M. Kaczmarek ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland
M. Staszuk ; Faculty of of Mechanical Engineering, Silesian University of Technology, Gliwice, Poland
M. Basiaga ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland

Puni tekst: engleski, pdf (194 KB) str. 179-181 preuzimanja: 251* citiraj
APA 6th Edition
Walke, W., Kaczmarek, M., Staszuk, M. i Basiaga, M. (2017). Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer. Metalurgija, 56 (1-2), 179-181. Preuzeto s https://hrcak.srce.hr/168925
MLA 8th Edition
Walke, W., et al. "Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer." Metalurgija, vol. 56, br. 1-2, 2017, str. 179-181. https://hrcak.srce.hr/168925. Citirano 19.01.2020.
Chicago 17th Edition
Walke, W., M. Kaczmarek, M. Staszuk i M. Basiaga. "Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer." Metalurgija 56, br. 1-2 (2017): 179-181. https://hrcak.srce.hr/168925
Harvard
Walke, W., et al. (2017). 'Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer', Metalurgija, 56(1-2), str. 179-181. Preuzeto s: https://hrcak.srce.hr/168925 (Datum pristupa: 19.01.2020.)
Vancouver
Walke W, Kaczmarek M, Staszuk M, Basiaga M. Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer. Metalurgija [Internet]. 2017 [pristupljeno 19.01.2020.];56(1-2):179-181. Dostupno na: https://hrcak.srce.hr/168925
IEEE
W. Walke, M. Kaczmarek, M. Staszuk i M. Basiaga, "Influence of purge, time of waiting and TiCl4 dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO2 layer", Metalurgija, vol.56, br. 1-2, str. 179-181, 2017. [Online]. Dostupno na: https://hrcak.srce.hr/168925. [Citirano: 19.01.2020.]

Sažetak
The aim of the study was to evaluate the influence of the ALD process parameters on mechanical properties and corrosion resistance of TiO2 layer. The TiO2 layer was deposited on stainless steel surfaces at constant temperature T = 200 °C and number of cycles nc = 500 (g ≈ 25 nm). The applied methodology consisted of potentiodynamic and impedance studies, as well as adhesion test. The obtained results were the basis for selection of surface treatment method for stainless steel implants for contact with blood. Appropriate parameters of surface treatment realized by means of the ALD method is of significant importance. It will contribute to the development of technological conditions of specified deposition parameters of TiO2 layers on steel implants.

Ključne riječi
316LVM; TiO2; ALD method; electrochemical properties; mechanical properties

Hrčak ID: 168925

URI
https://hrcak.srce.hr/168925

Posjeta: 385 *