Izvorni znanstveni članak
https://doi.org/10.5599/jese.584
Electrochemical behavior of tantalum in potassium hydroxide solutions
Irena Mickova
; Faculty of Technology and Metallurgy, University “Ss. Cyril and Methodius” Rudjer Boskovic 16, 1000 Skopje, Republic of Macedonia
Sažetak
The electrochemical behavior of tantalum in various concentrations of KOH solutions (0.1 M - 10 M), was investigated using the evolution of the open circuit potential in time, cyclic voltammetry and ellipsometric measurements. Depending on KOH concentrations, the open circuit potential measurements have shown three distinct behaviors concerning oxide film formation on the electrode surface and its dissolution. The cyclic voltammetry measurements were performed in various potential ranges, from -1.4 to 8 V, different concentrations of KOH solutions (0.110 M) and sweep rates ranging from 0.005 V/s to 1 V/s. In the passive region, very stable passive films were formed, which reduction has not been possible during cathodic polarization even at highly concentrated KOH solutions. In the trans-passive region, the very strong peak at 1.65 V was monitored, which nature and chemical composition is still not well known.
Ključne riječi
Ta; KOH; open circuit potentials; cyclic voltammetry; ellipsometry
Hrčak ID:
204434
URI
Datum izdavanja:
16.8.2018.
Posjeta: 1.032 *