Izvorni znanstveni članak
https://doi.org/10.5599/jese.708
Atomic layer deposited V2O5 coatings: a promising cathode for Li-ion batteries
Martyn Pemble
; Tyndall National Ιnstitute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland
Ian Povey
; Tyndall National Ιnstitute, University College Cork, Lee Maltings, Prospect Row, Cork, Ireland
Dimitra Vernardou
; Department of Electrical & Computer Engineering, School of Engineering, Hellenic Mediterranean University, 710 04 Heraklion, Crete, Greece
Sažetak
A modified, thermal atomic layer deposition process was employed for the pulsed chemical vapour deposition growth of vanadium pentoxide films using tetrakis (dimethylamino) vanadium and water as a co-reagent. Depositions were carried out at 350 °C for 400 pulsed CVD cycles, and samples were subsequently annealed for 1hour at 400 °C in air to form materials with enhanced cycling stability during the continuous lithium-ion intercalation/deintercalation processes. The diffusion coefficients were estimated to be 2.04x10-10 and 4.10x10-10 cm2 s-1 for the cathodic and anodic processes, respectively. These values are comparable or lower than those reported in the literature, indicating the capability of Li+ of getting access into the vanadium pentoxide framework at a fast rate. Overall, it presents a specific discharge capacity of 280 mA h g-1, capacity retention of 75 % after 10000 scans, a coulombic efficiency of 100 % for the first scan, dropping to 85 % for the 10000th scan, and specific energy of 523 W h g-1.
Ključne riječi
Pulsed-CVD; vanadium pentoxide; Li+intercalation/deintercalation; cyclic voltammetry; cycling stability; electron transport properties
Hrčak ID:
229463
URI
Datum izdavanja:
8.12.2019.
Posjeta: 746 *