Izvorni znanstveni članak
Thermal stability of CV deposited TiO2 thin films. XPS and AES characterization
Aleksandra Turković
; Ruđer Bošković Institute, P.O.B.1016, 41001 Zagreb, Croatia
Damir Šokčević
; Ruđer Bošković Institute, P.O.B.1016, 41001 Zagreb, Croatia
Tonica Valla
; Institute of Physics of the University, P.O.B. 304, 41001 Zagreb, Croatia
Milorad Milun
; Institute of Physics of the University, P.O.B. 304, 41001 Zagreb, Croatia
Jadranka Rukavina
; Institute of TEŽ, Folnegovićeva 10, 41000 Zagreb, Croatia
Sažetak
Thermal stability of TiO2 thin polycrystalline films obtained by the very simple chemical vapour deposition method on the quartz, molybdenum and gold substrates have been examined by X-ray photoelectron and Auger spectroscopy (XPS and AES), respectively, before and after annealing in vacuum at temperatures from 298 K to 1200 K. In this temperature range we have found carbon, water, and O-H groups as the impurities at the surface of the films. The possible influence of both the annealing and the impurities on the film stoichiometry is discussed.
Ključne riječi
Hrčak ID:
299365
URI
Datum izdavanja:
1.3.1993.
Posjeta: 217 *