Izvorni znanstveni članak
Grazing-incidence small-angle scattering of synchrotron radiation on nanosized TiO2 thin films obtained by chemical vapour deposition and spray method
Magdy Lučić-Lavčević
; Department of Physics, Faculty of Technology, University of Split, Teslina 10/V, 21000 Split, Croatia
Aleksandra Turković
; Institute Ruđer Bošković, P. O. Box 1016, 10000 Zagreb, Croatia
Damir Šokčević
; Institute Ruđer Bošković, P. O. Box 1016, 10000 Zagreb, Croatia
Pavao Dubček
; Institute Ruđer Bošković, P. O. Box 1016, 10000 Zagreb, Croatia; Sincrotrone Trieste S.c.p.A., ss. 14, km 163,5 Basovizza, 34012 Trieste, Italy
Ognjen Milat
; Institute of Physics, University of Zagreb, P. O. Box 304, 10000 Zagreb, Croatia
Božidar Etlinger
; Department of Physics, Faculty of Technology, University of Split, Teslina 10/V, 21000 Split, Croatia
Peter Laggner
; Institute for Biophysics and X-ray Structure Research, Austrian Academy of Sciences, Steyrerg 17, 8010 Graz, Austria
Heinz Amenitsch
; Sincrotrone Trieste S.c.p.A., ss. 14, km 163,5 Basovizza, 34012 Trieste, Italy; Institute for Biophysics and X-ray Structure Research, Austrian Academy of Sciences, Steyrerg 17, 8010 Graz, Austria
Sažetak
Nanosized TiO2, 1 μm thick, films on glass substrate were prepared using chemical vapour deposition (CVD) and spray method procedure. The average grain size < R > , obtained by grazing-incidence small-angle scattering of synchrotron radiation (GISAXS) varied with the annealing temperature (500 to 900 °C in H2, O2 and N2) for the CVD prepared samples. For TiO2 films obtained by the spray method, < R > increased with annealing temperature from 4.2 to 7.2 nm. Specific surface areas of both films were also determined and varied from 0.18·107 to 3.2·107 cm-1.
Ključne riječi
TiO2 thin films; chemical vapour deposition; deposition by spraying; annealing; size of grains; GISA
Hrčak ID:
300882
URI
Datum izdavanja:
1.7.1998.
Posjeta: 201 *