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Original scientific paper

Svojstva višeslojnih materijala ozračenih jakim neutronskim tokovima

Daniel Rajniak ; Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, STU, Ilkovičova 3, 812 19 Bratislava, Slovak Republic
Ladislav Harmatha ; Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, STU, Ilkovičova 3, 812 19 Bratislava, Slovak Republic
Milan Ziska ; Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, STU, Ilkovičova 3, 812 19 Bratislava, Slovak Republic
Otto Csabay ; Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, STU, Ilkovičova 3, 812 19 Bratislava, Slovak Republic
Viera Dubravcová ; Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, STU, Ilkovičova 3, 812 19 Bratislava, Slovak Republic


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Abstract

Višeslojni materijali na osnovi silicija izloženi su brzim neutronima tokovima od 1015 do 1019 n/cm2 . Mjerenja C − V , prijelazna spektroskopija dubokih stanja i I − V mjerenja načinjeni su radi analize svojstava višeslojeva kao i SiO2 – (nsilicij) te metal – (n-silicij) granice. Cini se da su glavni razlog smanjenja nositelja opažene dvojne šupljine i E-centri, koji ovise o početnoj koncentraciji dodataka (dopanata) u sloju. Pokazano je da obje istraživane granice sadrže klopke uzrokovane ozračivanjem.

Keywords

Hrčak ID:

299469

URI

https://hrcak.srce.hr/299469

Publication date:

2.5.1995.

Article data in other languages: english

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