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Fizika A : a journal of experimental and theoretical physics, Vol. 4 No. 2, 1995.

Original scientific paper

Structure and surface morphology of sputtered polycrystalline and nanocrystalline Ti films

Jindrich Musil ; University of West Bohemia, Americká 42, Plzeń, Czech Republic
Vlastimil Jezek ; University of West Bohemia, Americká 42, Plzeń, Czech Republic
Marcel Benda ; University of West Bohemia, Americká 42, Plzeń, Czech Republic
Milan Kubásek ; University of West Bohemia, Americká 42, Plzeń, Czech Republic
Dagmar Jandová ; University of West Bohemia, Americká 42, Plzeń, Czech Republic
Jaroslav Vlcek ; University of West Bohemia, Americká 42, Plzeń, Czech Republic

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Abstract

FIZIKA A 4 (1995) 2, 343-349

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STRUCTURE AND SURFACE MORPHOLOGY OF SPUTTERED POLYCRYSTALLINE AND NANOCRYSTALLINE Ti FILMS
JINDRICH MUSIL, VLASTIMIL JEŽEK, MARCEL BENDA, MILAN KUBÁSEK, DAGMAR JANDOVÁ and JAROSLAV VLČEK
University of West Bohemia, Americká 42, Plzeń, Czech Republic

Received 7 April 1995
We investigate the effect of ion bombardment on the structure and surface morphology of polycrystalline Ti (purity of 99.5 %) and nanocrystalline Ti-SS (stainless steel) films deposited by DC magnetron sputter ion plating (MSIP) process. The development of the structure and surface roughness with increasing negative substrate bias Us, strongly differs in polycrystalline Ti and in nanocrystalline Ti-SS films. The Ti films sputtered under Us ranging from 0 to -1500 V are regularly polycrystalline, while the Ti-SS films with a high content of SS elements, are nanocrystalline, even if sputtered at zero bias. The surface roughness of polycrystalline films increases with increasing negative bias Us and in Ti films sputtered at high Us (greater than -1000 V) reaches high values up to several micrometers. On the contrary, the surface of Ti-SS films sputtered at Us from 0 up to -1000 V is smooth and the surface roughness does not depend on the ion bombardment. Moreover, nanocrystalline Ti-SS films have a smoother surface than polycrystalline Ti films sputtered at zero bias. This is due to the large difference in the grain size of nanocrystalline (about 1 nm) and polycrystalline (hundreds of nm) films.

Keywords

Hrčak ID:

299489

URI

https://hrcak.srce.hr/299489

Publication date:

2.5.1995.

Article data in other languages: croatian

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