Skoči na glavni sadržaj

Fizika : a journal of experimental and theoretical physics, Vol. 22, supplement 1 , 1990.

Sažetak sa skupa

Sputtering negative ion source

T. Tadić ; Ruđer Bošković Institute, Zagreb
S. Fazinić ; Ruđer Bošković Institute, Zagreb
A. Gajski ; Ruđer Bošković Institute, Zagreb
L. Kukec ; Ruđer Bošković Institute, Zagreb
V. Valković ; Ruđer Bošković Institute, Zagreb

Puni tekst: engleski pdf 4.047 Kb

str. 89-96

preuzimanja: 54

citiraj

Sažetak

Ion sources based on the sputtering process proved to be versatile and capable of producing a large variety of negative ion beams for Tandem accelerators. Although the mechanism of the sputtering process is not yet fully understood, some present models for secondary ion emission give good agreement with experiments carried out so far. The ion source of this type is mounted at the Tandem accelerator of the Ruđer Bošković Institute in Zagreb. The general layout of the source and its principle of operation are presented as well as some further modifications for the application in the Accelerator Mass Spectrometry. The expected negative ion yields are listed.

Ključne riječi

Hrčak ID:

338440

URI

https://hrcak.srce.hr/338440

Datum izdavanja:

19.12.1990.

Posjeta: 193 *