Izvorni znanstveni članak

https://doi.org/10.5562/cca3127

Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors

Hrvoje Gebavi ; Center of Excellence for Advanced Materials and Sensing Devices, Research Unit New Functional Materials, Bijenička cesta 54, HR-10000 Zagreb, Croatia
Lara Mikac ; Center of Excellence for Advanced Materials and Sensing Devices, Research Unit New Functional Materials, Bijenička cesta 54, HR-10000 Zagreb, Croatia
Marijan Marciuš ; Ruđer Bošković Institute, Division of Materials Chemistry, Laboratory for Synthesis of New Materials, Bijenička cesta 54, HR-10000 Zagreb, Croatia
Mile Šikic ; Faculty of Electrical Engineering and Computing, Unska 3, HR-10000 Zagreb, Croatia
Vlasta Mohaček-Grošev ; Center of Excellence for Advanced Materials and Sensing Devices, Research Unit New Functional Materials, Bijenička cesta 54, HR-10000 Zagreb, Croatia
Tibor Janči ; University of Zagreb, Faculty of Food Technology and Biotechnology, Department of Food Engineering, Laboratory for Meat and Fish Technology, Pierottijeva 6, HR-10000 Zagreb, Croatia
Sanja Vidaćek ; University of Zagreb, Faculty of Food Technology and Biotechnology, Department of Food Engineering, Laboratory for Meat and Fish Technology, Pierottijeva 6, HR-10000 Zagreb, Croatia
Emina Hasanspahić ; University of Sarajevo, Faculty of Agricultural and food science, Zmaja od Bosne 8, BA-71000 Sarajevo, Bosnia and Herzegovina
Enisa Omanović Miklićanin ; University of Sarajevo, Faculty of Agricultural and food science, Zmaja od Bosne 8, BA-71000 Sarajevo, Bosnia and Herzegovina
Mile Ivanda ; Center of Excellence for Advanced Materials and Sensing Devices, Research Unit New Functional Materials, Bijenička cesta 54, HR-10000 Zagreb, Croatia

Sažetak

The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.

This work is licensed under a Creative Commons Attribution 4.0 International License.

Ključne riječi

electroless chemical etching; surface enhanced Raman spectroscopy; silicon nanowires; rhodamine

Hrčak ID:

185891

URI

https://hrcak.srce.hr/185891

Datum izdavanja:

3.7.2017.

Posjeta: 2.244 *