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Resistivity-thickness dependence of polycrystalline titanium films

Abd-El-Moneim A. Gabr ; Faculty of Science, Cairo University; Faculty of Education, A in-Shams University; National Research Centre and Military College, Cairo, Egypt
Mohamed I. El-Agrab ; Faculty of Science, Cairo University; Faculty of Education, A in-Shams University; National Research Centre and Military College, Cairo, Egypt
Mahmoud M. El-Nahass ; Faculty of Science, Cairo University; Faculty of Education, A in-Shams University; National Research Centre and Military College, Cairo, Egypt
Elhamy A. Abou-Saif ; Faculty of Science, Cairo University; Faculty of Education, A in-Shams University; National Research Centre and Military College, Cairo, Egypt
Mohamed E. Kamal ; Faculty of Science, Cairo University; Faculty of Education, A in-Shams University; National Research Centre and Military College, Cairo, Egypt

Sažetak

Transmission electron diffraction analysis showed that thin titanium films (thickness range from 10.9 to 1 1 3 nm) have polycrystalline structure. Films were deposited at a rate of 0.5-0.8 nm/s onto fresh cleaved mica substrates maintained at room temperature. Transmission electron microscopy indicated that the films are continuous, with needlelike structure. Fitting of resistivity-thickness relation has been carried out at different measuring temperatures. Agreement with Mayadas-Shatzkes theory was proved. The values of temperature coefficients of resistivity were positive. The mean free path of conduction electrons decreased from 44.19 to 21.43 nm with increasing temperature from 308 to 463 K.

Ključne riječi

Hrčak ID:

329117

URI

https://hrcak.srce.hr/329117

Datum izdavanja:

6.8.1984.

Podaci na drugim jezicima: hrvatski

Posjeta: 166 *