Preliminary communication

Influence of purge, time of waiting and TiCl₄ dosing time in a low-pressure atomic layer deposition (ALD) reactor on properties of TiO₂ layer

W. Walke ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland
M. Kaczmarek ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland
M. Staszuk ; Faculty of of Mechanical Engineering, Silesian University of Technology, Gliwice, Poland
M. Basiaga ; Faculty of Biomedical Engineering, Silesian University of Technology, Zabrze, Poland

Abstract

The aim of the study was to evaluate the influence of the ALD process parameters on mechanical properties and corrosion resistance of TiO₂ layer. The TiO₂ layer was deposited on stainless steel surfaces at constant temperature T = 200 °C and number of cycles n_c = 500 (g ≈ 25 nm). The applied methodology consisted of potentiodynamic and impedance studies, as well as adhesion test. The obtained results were the basis for selection of surface treatment method for stainless steel implants for contact with blood. Appropriate parameters of surface treatment realized by means of the ALD method is of significant importance. It will contribute to the development of technological conditions of specified deposition parameters of TiO₂ layers on steel implants.

Keywords

316LVM; TiO₂; ALD method; electrochemical properties; mechanical properties

Hrčak ID:

168925

URI

https://hrcak.srce.hr/168925

Publication date:

2.1.2017.

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