Izvorni znanstveni članak

Production of multiply charged ions from RF ion source

Mohamed E. Abdelaziz ; Plasma Physics and Accelerators Department, Atomic Energy Authority, Cairo, Egypt
Safwat G. Zakhary ; Plasma Physics and Accelerators Department, Atomic Energy Authority, Cairo, Egypt
Amin M. Abdelghaffar ; Plasma Physics and Accelerators Department, Atomic Energy Authority, Cairo, Egypt

Sažetak

A design of the RF ion source is made to develop its capability for production of multiply charged ions by the use of magnetic mirror, mechanical constriction at the plasma tube center and electron beam-plasma interaction. An emphasis is given to study the plasma characteristics i. e. density, electron temperature, plasma oscillations, by the use of cylindrical Langmuir probe. It was found that the magnetic field increases the discharge intensity from 109 electrons/cm3 at B = 0 to ≈1012 electrons/cm3 at B = 0.028 T. The mechanical constriction increases the plasma density to ≈ 4.3 times the value of the plasma density without mechanical constriction. With electron plasma interaction the intensity of the plasma increases to reach more than 1012 electrons/cm3. Also the amplitude and frequency of the plasma oscillations increase with the increase of the extraction potential. Both the increase of the plasma intensity and plasma oscillations make the value of Ar+3, Ar+4 larger than the value without electron plasma interaction.

Ključne riječi

Hrčak ID:

331476

URI

https://hrcak.srce.hr/331476

Datum izdavanja:

8.1.1989.

Podaci na drugim jezicima: hrvatski

Posjeta: 346 *