Pismo uredniku
CR-39(DOP) as a relativistic 238U-ion detector
Deba P. Bhattacharyya
; Department of Theoretical Physics, Indian Association for the Cultivation of Science, Jadavpur, Calcutta 700 032, India
Ruma Rakshit
; Department of Theoretical Physics, Indian Association for the Cultivation of Science, Jadavpur, Calcutta 700 032, India
Pratibha Pal
; Department of Theoretical Physics, Indian Association for the Cultivation of Science, Jadavpur, Calcutta 700 032, India
Sažetak
CR-39(DOP) stack was exposed to 927 MeV/n 238 92 U beam from the Lawrence Berkeley Laboratory (LBL) accelerator BEVALAC at an angle of 30o to the detector surface. The chemically processed sheets were investigated using a Leitz Ortholux optical microscope. 644 etch pit cone lengths were measured and the track etch rate has been found to be (174 ± 11) µm/h. The present result is in accord with the data of Heyna et al. The estimated charge sensitivity has been found to follow the extrapolated results of Salamon et al. The present survey on the etch rate ratio has been found to increase faster than exponentially with Z/β and follows the relation VT /VG = exp[A + B(Z/β − 60) + C(Z/β − 60)2 ] where A = 1.623 ± 0.064, B = −0.0444± 0.0015 and C = 0.000506 ± 0.000064 for 27.6 ≤ Z/β ≤ 106.4.
Ključne riječi
Hrčak ID:
303456
URI
Datum izdavanja:
1.3.1995.
Posjeta: 400 *