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Dissociative mechanism of copper diffusion in germanium

V. V. Spirić ; Institute "Boris Kidrič", Beograd
A. Damjanović ; Institute "Boris Kidrič", Beograd

Sažetak

The dissociative mechanism of copper diffusion in germanium is studied. The rates of all processes taking place in diffusion are estimated. It is concluded that the diffusion of the copper atoms depends essentially on the diffusion of vacancies in the temperature region 650 - 750 °C if the thickness of the sample is about 1 -mm and dislocation density below 10^3 cm-^2. Using the sheet conductance and p - n junction methods, it is indicated experimentally that the copper atoms diffuse in germanium from all boundary surfaces, regardless of the exact location of copper before diffusion. This confirms directly the dissociative mechanism of copper diffusion in germanium. The diffusion coefficient of copper in the above temperature range is measured as a function of temperature.

Ključne riječi

copper diffusion; germanium

Hrčak ID:

321419

URI

https://hrcak.srce.hr/321419

Datum izdavanja:

1.7.1970.

Podaci na drugim jezicima: srpski

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