Izvorni znanstveni članak
https://doi.org/10.17559/TV-20151125085632
XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)
Krzysztof Rokosz
; Division of Bioengineering and Surface Electrochemistry, Department of Engineering and Informatics Systems Faculty of Mechanical Engineering, Koszalin University of Technology, Racławicka 15-17, 75-620 Koszalin, Poland
Tadeusz Hryniewicz
; Division of Bioengineering and Surface Electrochemistry, Department of Engineering and Informatics Systems Faculty of Mechanical Engineering, Koszalin University of Technology, Racławicka 15-17, 75-620 Koszalin, Poland
Steinar Raaen
; Department of Physics Norwegian, University of Science and Technology (NTNU), Realfagbygget E3-124 Høgskoleringen 5, NO 7491 Trondheim, Norway
Sažetak
In the paper, a novel process named the High-Voltage Electropolishing (HVEP) is proposed to gain the specific surface properties on the treated metallic material. The AISI 304L stainless steel as the biomaterial was used for the HVEP treatment. Another feature of this work is using a concentrated phosphoric acid solution within the copper nitrate as electrolyte. The main purpose of the HVEP processing in that kind of electrolyte was to incorporate the copper ions into the passive surface film. Such a modified surface nanolayer was studied by means of the X-ray Photoelectron Spectroscopy (XPS) to reveal the composition of the obtained film. The comparison of the numerical results, dependent on the voltage applied, was performed. Moreover, the Cr/Fe and Cu/P ratios were determined to show the advantages of this electrochemical HVEP treatment.
Ključne riječi
AISI 304L SS; copper nitrate; High-Voltage Electropolishing (HVEP); phosphoric acid; XPS
Hrčak ID:
186071
URI
Datum izdavanja:
2.9.2017.
Posjeta: 2.172 *