Izvorni znanstveni članak
Dissociative mechanism of copper diffusion in germanium
V. V. Spirić
; Institute "Boris Kidrič", Beograd
A. Damjanović
; Institute "Boris Kidrič", Beograd
Sažetak
The dissociative mechanism of copper diffusion in germanium is studied. The rates of all processes taking place in diffusion are estimated. It is concluded that the diffusion of the copper atoms depends essentially on the diffusion of vacancies in the temperature region 650 - 750 °C if the thickness of the sample is about 1 -mm and dislocation density below 10^3 cm-^2. Using the sheet conductance and p - n junction methods, it is indicated experimentally that the copper atoms diffuse in germanium from all boundary surfaces, regardless of the exact location of copper before diffusion. This confirms directly the dissociative mechanism of copper diffusion in germanium. The diffusion coefficient of copper in the above temperature range is measured as a function of temperature.
Ključne riječi
Hrčak ID:
321419
URI
Datum izdavanja:
1.7.1970.
Posjeta: 150 *