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A new approach for refractive index measurement of the double layer poly-silicon films

Ioanna Demakopoulou ; Department of Physics, Faculty of Natural Sciences, University of Prishtina, Yugoslavia
Jahja Kokaj ; Department of Physics, Faculty of Natural Sciences, University of Prishtina, Yugoslavia


Puni tekst: engleski pdf 3.823 Kb

str. 285-287

preuzimanja: 61

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Sažetak

Interferometry approach for the index refraction measurement of the poly-Si films is proposed. Only spectral values ωRmin, ωRmax which are related to reflected values Rmin, Rmax are measured. Beside pure scientific investigations this approach can be used for routine control of the poly-Si films.

Ključne riječi

Hrčak ID:

332039

URI

https://hrcak.srce.hr/332039

Datum izdavanja:

10.9.1991.

Podaci na drugim jezicima: hrvatski

Posjeta: 320 *