Skip to the main content

Fizika : a journal of experimental and theoretical physics, Vol. 22, supplement 1 , 1990.

Meeting abstract

Sputtering negative ion source

T. Tadić ; Ruđer Bošković Institute, Zagreb
S. Fazinić ; Ruđer Bošković Institute, Zagreb
A. Gajski ; Ruđer Bošković Institute, Zagreb
L. Kukec ; Ruđer Bošković Institute, Zagreb
V. Valković ; Ruđer Bošković Institute, Zagreb

Full text: english pdf 4.047 Kb

page 89-96

downloads: 54

cite

Abstract

Ion sources based on the sputtering process proved to be versatile and capable of producing a large variety of negative ion beams for Tandem accelerators. Although the mechanism of the sputtering process is not yet fully understood, some present models for secondary ion emission give good agreement with experiments carried out so far. The ion source of this type is mounted at the Tandem accelerator of the Ruđer Bošković Institute in Zagreb. The general layout of the source and its principle of operation are presented as well as some further modifications for the application in the Accelerator Mass Spectrometry. The expected negative ion yields are listed.

Keywords

Hrčak ID:

338440

URI

https://hrcak.srce.hr/338440

Publication date:

19.12.1990.

Visits: 193 *