Skip to the main content

Original scientific paper

https://doi.org/10.5599/jese.2983

Growth of a W/TiN-bilayer coating: an alternative to diffusion barrier keeping the hard coating condition of the system

Amilkar Fragiel ; Centro de Física, Instituto Venezolano de Investigaciones Científicas
Francisco Solis-Pomar ; Universidad Autonoma de Nuevo Leon *
Abel Fundora ; Instituto Superior de Tecnologías y Ciencias Aplicadas, Universidad de la Habana
Bernardo Campillo ; Instituto de Ciencias Físicas, Universidad Nacional Autónoma de México
José María Malo-Tamayo ; Instituto Nacional de Electricidad y Energías Limpias
Ana María Campos-Chinchilla orcid id orcid.org/0009-0001-9415-5569 ; Centro de Física, Instituto Venezolano de Investigaciones Científicas
Aly Castellanos-Suárez ; Centro de Física, Instituto Venezolano de Investigaciones Científicas
Mercedes Teresita Oropeza-Guzmán ; Tecnología Nacional de México, Instituto Tecnológico de Tijuana, Departamento de Ingeniería Química y Bioquímica
Eduardo Perez-Tijerina orcid id orcid.org/0000-0001-9742-4093 ; Universidad Autónoma de Nuevo León, Centro de Investigación en Ciencias Físico Matemáticas, Facultad de Ciencias Físico-Matemáticas

* Corresponding author.


Full text: english pdf 1.685 Kb

downloads: 124

cite


Abstract

An evaluation of the improvement provided by a W thin film, when incorporated into a TiN bilayer coating system on 304 stainless steel, is reported after determining its electrochemical behaviour and mechanical properties. The TiN-bilayer and W/TiN-bilayer coatings were prepared by balanced magnetron sputtering. Coating structure, morphology, interphase, and chemical composition were determined by scanning electron microscopy, Auger electron spectroscopy and X-ray diffraction. Mechanical properties were determined by the nanoindentation technique. The electrochemical behavior was investigated by electrochemical impedance spectroscopy (EIS) using 6 wt.% NaCl solution as electrolyte. The electrochemical results showed an increase in overall corrosion resistance (Rp) when the W thin film is incorporated into the TiN-bilayer coating system. The Rp for the initial measurement is 187.6 and 347.9 kΩ cm2 for the TiN-bilayer coating system and W/TiN-bilayer coating system, respectively. The results obtained from the EIS study over time indicate that the Rp after 7 weeks of immersion are 53.2 and 119.8 kΩ cm2 for the TiN-bilayer coating system and W/TiN-bilayer coating system, respectively. Nanoindentation hardness measurements showed a slight difference between the two coating systems. The TiN-bilayer hardness showed a value of approximately 24 GPa, while the W/TiN-bilayer hardness showed a value of approximately 22 GPa. Considering other beneficial properties associated with W, the results showed that a W/TiN-bilayer coating system can be used as an alternative hard and protective coating system on steel substrates to mitigate corrosion damage.

Keywords

Two-layer coatings; tungsten thin films; magnetron sputtering; nodular defects; diffusion barrier

Hrčak ID:

344852

URI

https://hrcak.srce.hr/344852

Publication date:

2.1.2026.

Visits: 239 *