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Original scientific paper
https://doi.org/10.5562/cca3149

Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation

Robert Peter ; Department of Physics and Center for Micro- and Nanosciences and Technologies, University of Rijeka, R. Matejčić 2, HR-51000 Rijeka, Croatia
Iva Šarić ; Department of Physics and Center for Micro- and Nanosciences and Technologies, University of Rijeka, R. Matejčić 2, HR-51000 Rijeka, Croatia
Mladen Petravić ; Department of Physics and Center for Micro- and Nanosciences and Technologies, University of Rijeka, R. Matejčić 2, HR-51000 Rijeka, Croatia

Fulltext: english, pdf (2 MB) pages 163-168 downloads: 1.311* cite
APA 6th Edition
Peter, R., Šarić, I. & Petravić, M. (2017). Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation. Croatica Chemica Acta, 90 (2), 163-168. https://doi.org/10.5562/cca3149
MLA 8th Edition
Peter, Robert, et al. "Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation." Croatica Chemica Acta, vol. 90, no. 2, 2017, pp. 163-168. https://doi.org/10.5562/cca3149. Accessed 12 May 2021.
Chicago 17th Edition
Peter, Robert, Iva Šarić and Mladen Petravić. "Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation." Croatica Chemica Acta 90, no. 2 (2017): 163-168. https://doi.org/10.5562/cca3149
Harvard
Peter, R., Šarić, I., and Petravić, M. (2017). 'Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation', Croatica Chemica Acta, 90(2), pp. 163-168. https://doi.org/10.5562/cca3149
Vancouver
Peter R, Šarić I, Petravić M. Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation. Croatica Chemica Acta [Internet]. 2017 [cited 2021 May 12];90(2):163-168. https://doi.org/10.5562/cca3149
IEEE
R. Peter, I. Šarić and M. Petravić, "Enhanced Oxidation of Nickel at Room Temperature by Low-energy Oxygen Implantation", Croatica Chemica Acta, vol.90, no. 2, pp. 163-168, 2017. [Online]. https://doi.org/10.5562/cca3149

Abstracts
The formation of oxide films on pure Ni surfaces by low energy oxygen ion-beam bombardment at room temperature was studied by X-ray photoelectron spectroscopy. Ion-induced oxidation is more efficient in creating thin NiO films on Ni surfaces than oxidation in oxygen atmosphere. The oxide thickness of bombarded samples is related to the penetration depth of oxygen ions in Ni and scales with the dose of implanted oxygen, Φ, as Φ1/6. This type of oxide growth is predicted theoretically for diffusion of Ni cations by doubly charged cation vacancies, which creation and mobility is greatly enhanced by ion-irradiation.

Creative Commons License This work is licensed under a Creative Commons Attribution 4.0 International License.

Keywords
oxidation of Ni; XPS; ion-beam bombardment; parabolic growth rate; oxygen implantation; NiO; oxidation in oxygen atmosphere

Hrčak ID: 184788

URI
https://hrcak.srce.hr/184788

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