XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)
Krzysztof Rokosz
; Division of Bioengineering and Surface Electrochemistry, Department of Engineering and Informatics Systems Faculty of Mechanical Engineering, Koszalin University of Technology, Racławicka 15-17, 75-620 Koszalin, Poland
Tadeusz Hryniewicz
; Division of Bioengineering and Surface Electrochemistry, Department of Engineering and Informatics Systems Faculty of Mechanical Engineering, Koszalin University of Technology, Racławicka 15-17, 75-620 Koszalin, Poland
Steinar Raaen
; Department of Physics Norwegian, University of Science and Technology (NTNU), Realfagbygget E3-124 Høgskoleringen 5, NO 7491 Trondheim, Norway
APA 6th Edition Rokosz, K., Hryniewicz, T. i Raaen, S. (2017). XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP). Tehnički vjesnik, 24 (Supplement 2), 321-326. https://doi.org/10.17559/TV-20151125085632
MLA 8th Edition Rokosz, Krzysztof, et al. "XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)." Tehnički vjesnik, vol. 24, br. Supplement 2, 2017, str. 321-326. https://doi.org/10.17559/TV-20151125085632. Citirano 05.03.2021.
Chicago 17th Edition Rokosz, Krzysztof, Tadeusz Hryniewicz i Steinar Raaen. "XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)." Tehnički vjesnik 24, br. Supplement 2 (2017): 321-326. https://doi.org/10.17559/TV-20151125085632
Harvard Rokosz, K., Hryniewicz, T., i Raaen, S. (2017). 'XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)', Tehnički vjesnik, 24(Supplement 2), str. 321-326. https://doi.org/10.17559/TV-20151125085632
Vancouver Rokosz K, Hryniewicz T, Raaen S. XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP). Tehnički vjesnik [Internet]. 2017 [pristupljeno 05.03.2021.];24(Supplement 2):321-326. https://doi.org/10.17559/TV-20151125085632
IEEE K. Rokosz, T. Hryniewicz i S. Raaen, "XPS analysis of nanolayer formed on AISI 304L SS after High-Voltage Electropolishing (HVEP)", Tehnički vjesnik, vol.24, br. Supplement 2, str. 321-326, 2017. [Online]. https://doi.org/10.17559/TV-20151125085632
APA 6th Edition Rokosz, K., Hryniewicz, T. i Raaen, S. (2017). XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP). Tehnički vjesnik, 24 (Supplement 2), 321-326. https://doi.org/10.17559/TV-20151125085632
MLA 8th Edition Rokosz, Krzysztof, et al. "XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP)." Tehnički vjesnik, vol. 24, br. Supplement 2, 2017, str. 321-326. https://doi.org/10.17559/TV-20151125085632. Citirano 05.03.2021.
Chicago 17th Edition Rokosz, Krzysztof, Tadeusz Hryniewicz i Steinar Raaen. "XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP)." Tehnički vjesnik 24, br. Supplement 2 (2017): 321-326. https://doi.org/10.17559/TV-20151125085632
Harvard Rokosz, K., Hryniewicz, T., i Raaen, S. (2017). 'XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP)', Tehnički vjesnik, 24(Supplement 2), str. 321-326. https://doi.org/10.17559/TV-20151125085632
Vancouver Rokosz K, Hryniewicz T, Raaen S. XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP). Tehnički vjesnik [Internet]. 2017 [pristupljeno 05.03.2021.];24(Supplement 2):321-326. https://doi.org/10.17559/TV-20151125085632
IEEE K. Rokosz, T. Hryniewicz i S. Raaen, "XPS analiza nano sloja nastalog na AISI 304L SS nakon elektropoliranja pod visokim naponom (HVEP)", Tehnički vjesnik, vol.24, br. Supplement 2, str. 321-326, 2017. [Online]. https://doi.org/10.17559/TV-20151125085632
Sažetak In the paper, a novel process named the High-Voltage Electropolishing (HVEP) is proposed to gain the specific surface properties on the treated metallic material. The AISI 304L stainless steel as the biomaterial was used for the HVEP treatment. Another feature of this work is using a concentrated phosphoric acid solution within the copper nitrate as electrolyte. The main purpose of the HVEP processing in that kind of electrolyte was to incorporate the copper ions into the passive surface film. Such a modified surface nanolayer was studied by means of the X-ray Photoelectron Spectroscopy (XPS) to reveal the composition of the obtained film. The comparison of the numerical results, dependent on the voltage applied, was performed. Moreover, the Cr/Fe and Cu/P ratios were determined to show the advantages of this electrochemical HVEP treatment.