Original scientific paper

Površina silicija ozračena dušikovim laserskim zračenjem

Višnja Henč-Bartolić ; Dept. of Applied Physics, Faculty of Electrical Engineering and Computing, University of Zagreb, Unska 3, HR-10000 Zagreb, Croatia
Željko Andreić ; Laboratory for Ionized Gases, Division for Material Research and Electronics, Dept. of Physics, Rudjer Bošković Institute, Bijenička 54, HR-10000 Zagreb, Croatia
Davor Gracin ; Laboratory for Ionized Gases, Division for Material Research and Electronics, Dept. of Physics, Rudjer Bošković Institute, Bijenička 54, HR-10000 Zagreb, Croatia
Hans-Joachim Kunze ; Ruhr-Universität Bochum, Fakultät für Physik und Astronomie, Institut für Experimentalphysik V, D-44780 Bochum, Germany
Mirko Stubičar ; Dept. of Physics, Faculty of Science, University of Zagreb, Bijenička 32, HR-10000 Zagreb, Croatia

Abstract

Monokristalni silicij se ozračivao snopom iz dušik ovog lasera (λ = 337 nm, maksimalna snaga 1.1 J/cm2 , trajanje pulsa 6 ns i frekvencija 0.2 Hz). Plazma nastala na površini silicija se promatrala spektroskopski u zraku (ne = 3 = 1018 cm 3 , Te 18500 K) i u vakuumu (ne = 6 ¬ 5 = 1017 cm 3 , Te = 16000 K). Površina ozračena u vakuumu se proučavala pomoću metalografskog mikroskopa. Opazile su se kapljice oko ruba udubine na siliciju. Nastajanje kapljica se tumači hidrodinamičkim modelom.

Keywords

Hrčak ID:

299846

URI

https://hrcak.srce.hr/299846

Publication date:

1.6.1997.

Article data in other languages: english

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