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Nonlinearity of the Piezoresistive Effect of p-Type Silicon Diffused Layers with High Surface Concentration

Jovan Matovic ; Institute of Chemistry, Technology and Metalurgy, Institute of Microelectronic Technologies and Single Crystals, Beograd, Njegoseva 12, Yugoslavia
Zoran Djuric ; Institute of Chemistry, Technology and Metalurgy, Institute of Microelectronic Technologies and Single Crystals, Beograd, Njegoseva 12, Yugoslavia


Puni tekst: engleski pdf 9.929 Kb

str. 324-327

preuzimanja: 79

citiraj


Sažetak

In this work we present results of measurement of piezoresistivity coefficients of <100> oriented silicon with high boron dopant concentrations. An nonlinear approximative expression has been derivated, that can treat piezoresistance effect quantitavely. The results of this work were used to discuss the nonlinearity of integrated piezoresistive bridge pressure sensors, in which the piezoresistors were obtained by diffusion of boron into silicon diaphragm.

Ključne riječi

Hrčak ID:

339951

URI

https://hrcak.srce.hr/339951

Datum izdavanja:

20.12.1989.

Posjeta: 181 *